Photosensitive recording material

Details Photosensitive recording material Photosensitive recording material

1989-02-24

1990-06-26

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430944, 430945, 430494, 428 65, 428145, 369147, 369284, 369285, G03C 176

Patent

active

049371711

ABSTRACT:
A photosensitive recording material for recording information by means of a local change in the optical properties of a recording layer under the action of light having a high energy density, and a process for its preparation.

REFERENCES:
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patent: 4252890 (1981-02-01), Haas et al.
patent: 4336173 (1982-06-01), Ugelstad
patent: 4780356 (1988-10-01), Otouma et al.
J. Kosar, "Light-Sensitive Systems", pp. 402-416 (J. Wiley & Sons, N.Y., London, Sidney 1965).
H. Gerrens, "Kinetik der Emulsionspolymerisation", Fortschr. Hochpolym.-Forsch., Bd. 1, (1959) pp. 234-328.
J. Ugelstad, F. K. Hansen, "Kinetics and Mechanism of Emulsion Polymerization", Rubber Chemistry and Technology, vol. 49 (1976) pp. 536-609.
I. M. Krieger et al., "Journal Paint Technology 40", (1968) p. 545.
I. M. Krieger et al., "Journal Paint Technology 42", (1970) pp. 71 and 571.
A. Kotera et al., "Kolloid Z.", Zeitschrift F. Polymere 239, (1970), pp. 677-681.
Appl. Phys. Lett. 40, pp. 622-624 (1982).

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