Photosensitive polymer composition containing an ethylenically u

Details Photosensitive polymer composition containing an ethylenically u Photosensitive polymer composition containing an ethylenically u

1987-10-05

1989-12-26

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430906, 430286, 430287, 430281, 522136, 522137, 522144, 522 78, 522 93, 522 96, 522145, G03C 170, G03C 168

Patent

active

048897930

ABSTRACT:
The present invention relates to a photosensitive polymer composition comprising the following components A, B and C:

REFERENCES:
patent: 3770438 (1973-11-01), Celeste
patent: 3850770 (1974-11-01), Juna et al.
patent: 4144073 (1979-03-01), Bronstert et al.
patent: 4198236 (1980-04-01), Held
patent: 4323639 (1982-04-01), Chiba et al.
patent: 4481280 (1984-11-01), Fujikawa et al.
Patent Abstracts of Japan, vol. 8, No. 208 (P-302) [1645] (Toray K.K.)

Affiliated with

Also associated with

Rating

Photosensitive polymer composition containing an ethylenically u does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive polymer composition containing an ethylenically u, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive polymer composition containing an ethylenically u will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1576952