Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-06-16
1999-07-20
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302831, 4302851, 4302731, G03F 7028, G03F 7038, G03F 709
Patent
active
059254980
ABSTRACT:
A photosensitive composition can be used to prepare negative-working photosensitive elements such as lithographic printing plates. The composition includes a first photocrosslinkable aromatic resin having photocrosslinkable groups and a number average molecular weight of at least about 1500. Also included is a mixture of a polyalkyleneglycol diacrylate and polyacrylate polymerizable monomers, a photocrosslinkable polyester, a photoinitiator, and a photosensitizer. The photosensitive resins are present at a total weight ratio to the polymerizable monomers of at least 1.5:1.
REFERENCES:
patent: 2732301 (1956-01-01), Robertson et al.
patent: 3030208 (1962-04-01), Scheilenberg
patent: 3622320 (1971-11-01), Allen
patent: 3702765 (1972-11-01), Laakso
patent: 3929489 (1975-12-01), Arcesi et al.
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4062686 (1977-12-01), Van Allen et al.
patent: 4239850 (1980-12-01), Kita et al.
patent: 4258123 (1981-03-01), Nagashima et al.
patent: 4414312 (1983-11-01), Goff et al.
patent: 4416973 (1983-11-01), Goff
patent: 4454220 (1984-06-01), Goff
patent: 4458007 (1984-07-01), Geissler et al.
patent: 4481276 (1984-11-01), Ishikawa et al.
patent: 4505793 (1985-03-01), Tamoto et al.
patent: 5045432 (1991-09-01), West et al.
patent: 5061600 (1991-10-01), West et al.
patent: 5085975 (1992-02-01), Mueller
patent: 5141842 (1992-08-01), Mitchell et al.
DoMinh Thap
Gurney Jeffery A.
Kalamen John
Kloxin Christopher J.
West Paul R.
Hamilton Cynthia
Kodak Polychrome Graphics LLC
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