Photosensitive polymer and chemically amplified photoresist...

Details Photosensitive polymer and chemically amplified photoresist... Photosensitive polymer and chemically amplified photoresist...

2005-05-17

2005-05-17

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S914000

Reexamination Certificate

active

06893793

ABSTRACT:
The photosensitive polymer includes a first monomer which is norbornene ester having C1to C12aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

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