Photosensitive polyimidosiloxane compositions and insulating fil

Details Photosensitive polyimidosiloxane compositions and insulating fil Photosensitive polyimidosiloxane compositions and insulating fil

1997-12-05

2000-08-01

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522 99, 525421, 528 26, G03F 7038

Patent

active

060964804

ABSTRACT:
A photosensitive polyimidosiloxane composition comprising a polyimidosiloxane comprising 15-80 mole percent of the units, ##STR1## wherein X represents CO, O or a direct bond and R.sub.3 represents an aromatic residue containing a photosensitive group with an unsaturated hydrocarbon group, and 85-20 mole percent of the units, ##STR2## wherein X is as defined above, each R.sub.4 independently represents a divalent hydrocarbon residue, each R.sub.5 independently represents an alkyl group of 1-3 carbon atoms and 1 represents an integer of 3-30, a finely divided inorganic filler, and an organic solvent. The composition provides films having excellent light transmittance.

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