Photosensitive polyimide resin composition containing a stabiliz

Details Photosensitive polyimide resin composition containing a stabiliz Photosensitive polyimide resin composition containing a stabiliz

1996-10-15

1998-05-26

Codd, Bernard P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302871, 522164, G03C 173

Patent

active

057562601

ABSTRACT:
By using a polyamic acid ester comprising the following structural units (1a), (1b) and (1c) as a photosensitive resin and a sulfonamide compound or a specific glycol ether acetate as a stabilizer, a photo-sensitive resin composition excellent especially in viscosity stability can be obtained, and by using the above photosensitive resin and a specific developer, a relief pattern of high resolution can be formed. ##STR1## (the symbols in the formulas are as defined in the specification)

REFERENCES:
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4481280 (1984-11-01), Fujikawa et al.
patent: 4550069 (1985-10-01), Pampalone
patent: 4980268 (1990-12-01), Bartmann et al.
patent: 5114826 (1992-05-01), Kwong et al.
patent: 5262277 (1993-11-01), Sato et al.
Sashida et al. --English Translation of JP 5-127384, May 1993.
Sashida et al. --English Translaiton of JP 4-120543, Apr. 1992.

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