Photosensitive polyamic acid derivative, compounds used in the m

Details Photosensitive polyamic acid derivative, compounds used in the m Photosensitive polyamic acid derivative, compounds used in the m

1986-02-10

1987-04-28

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430283, 430286, 430330, 430327, 430 18, G03C 516, G03F 726

Patent

active

046614354

ABSTRACT:
A photosensitive polyamic acid derivative, compounds used in the manufacture of the derivative, method of manufacturing a polyimide pattern on a substrate, and semiconductor device comprising a polyimide pattern obtained by using the said method.

REFERENCES:
patent: 4158731 (1979-06-01), Baumann et al.
patent: 4292398 (1981-09-01), Rubner et al.
patent: 4329419 (1982-05-01), Goff et al.
Roland Rubner, "Production of Highly Heat-Resistant Film Patterns from Photoreactive Polymeric Precursors, Part 1, General Principle" Siemens Forsch.-u. Entwickl. Ber. Bd. 5(1976), No. 2, pp. 92-97.

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