Photosensitive patternable coating composition containing novola

Details Photosensitive patternable coating composition containing novola Photosensitive patternable coating composition containing novola

1978-12-08

1980-12-02

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415915, 430281, 430288, 430311, 430312, G03C 168, C08F 800

Patent

active

042372160

ABSTRACT:
A photosensitive coating composition comprising a reaction product of a monoethylenically unsaturated carboxylic acid and an epoxy polymer having at least about six epoxy groups; a polyethylenically unsaturated compound; and photoinitiator; and method of employing the same.

REFERENCES:
patent: 3301743 (1967-01-01), Fekete et al.
patent: 3450613 (1969-06-01), Steinberg
patent: 3637618 (1972-01-01), May
patent: 3804735 (1974-04-01), Radlowe et al.
patent: 3847770 (1974-11-01), Radlowe et al.
patent: 3912670 (1975-10-01), Huemmer et al.
patent: 3968016 (1976-07-01), Wismer
patent: 4014771 (1977-03-01), Rosenkranz et al.
patent: 4169732 (1979-10-01), Shipley

Affiliated with

Also associated with

Rating

Photosensitive patternable coating composition containing novola does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive patternable coating composition containing novola, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive patternable coating composition containing novola will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2284613