Photosensitive material having a silicon-containing polymer

Details Photosensitive material having a silicon-containing polymer Photosensitive material having a silicon-containing polymer

1989-09-21

1991-10-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430313, 430197, 528 31, G03C 500

Patent

active

050573969

ABSTRACT:
A silicon-containing polymer comprising repeating units of silicon-containing cyclic compound, represented by a general formula (I) ##STR1## (wehrein m and n are positive integers including 0, respectively, however m+n>0, and X is any of alkyl group, alkoxy group, phenyl group, naphthyl group, substituted phenyl group and substituted naphthyl group or a mixture of these, and the substituent of said substituted phenyl group or substituted naphthyl group indicates any of halogen atom, halogenated alkyl group, amino group, aminoalkyl group and nitro group or a mixture of these), and a photosensitive material containing said silicon-containing polymer are disclosed.

REFERENCES:
patent: 3969543 (1976-07-01), Roberts et al.
patent: 4507384 (1985-03-01), Morita et al.
patent: 4600685 (1986-07-01), Kitakohji et al.
patent: 4657843 (1987-04-01), Fukuyama et al.
patent: 4702990 (1987-10-01), Tanaka et al.
patent: 4722881 (1988-02-01), Ueno et al.

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