Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-01-08
2008-01-08
Kelly, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S300000, C430S281100
Reexamination Certificate
active
07316887
ABSTRACT:
A photosensitive lithographic printing plate comprises a photosensitive layer and a protective layer formed in this order on a support, wherein the photosensitive layer has a maximum peak of spectral sensitivity within a wavelength range ranging from 390 to 430 nm, the minimum exposure for the photosensitive lithographic printing plate for image formation at a wavelength of 410 nm (S410) is at most 100 μJ/cm2, and the relation between the minimum exposure for image formation at a wavelength of 450 nm (S450) and the minimum exposure for image formation at a wavelength of 410 nm (S410) is 0<S410/S450≦0.1.
REFERENCES:
patent: 3458311 (1969-07-01), Alles
patent: 4162162 (1979-07-01), Dueber
patent: 4387139 (1983-06-01), Herwig et al.
patent: 4535052 (1985-08-01), Anderson et al.
patent: 5229790 (1993-07-01), Matsuura et al.
patent: 5353048 (1994-10-01), Kanai
patent: 5663212 (1997-09-01), Wakata et al.
patent: 5738974 (1998-04-01), Nagasaka et al.
patent: 5800965 (1998-09-01), Tsuji et al.
patent: 5863678 (1999-01-01), Urano et al.
patent: 5998095 (1999-12-01), Nagase
patent: 6010824 (2000-01-01), Komano et al.
patent: 6030748 (2000-02-01), Nishimiya et al.
patent: 6153356 (2000-11-01), Urano et al.
patent: 6232038 (2001-05-01), Takasaki et al.
patent: 6544720 (2003-04-01), Takasaki et al.
patent: 6558875 (2003-05-01), Toshimitsu et al.
patent: 2003/0172828 (2003-09-01), Tabuchi et al.
patent: 0 793 145 (1997-09-01), None
patent: 949540 (1999-10-01), None
patent: 985683 (2000-03-01), None
patent: 9-105810 (1997-04-01), None
patent: 9-105811 (1997-04-01), None
patent: 2000-056457 (2000-02-01), None
patent: 2000-206690 (2007-01-01), None
Monroe et al.; Chem. Rev.; vol. 93; pp. 435-448; 1993.
RN 112-34-5; Registry; American Chemical Society; 2003.
Monroe, et al.,Chem. Rev., vol. 93, pp. 435-448 (1993).
RN 112-34-5, REGISTRY, Copyright 2003, American Chemical Society.
Kohori Kazuhiro
Okamoto Hideaki
Urano Toshiyuki
Johnson Connie P.
Keating & Bennett LLP
Kelly Cynthia
Lastra S.p.A.
LandOfFree
Photosensitive lithographic printing plate and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive lithographic printing plate and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive lithographic printing plate and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2747466