Photosensitive lithographic plate using no dampening water

Details Photosensitive lithographic plate using no dampening water Photosensitive lithographic plate using no dampening water

1987-11-23

1989-08-29

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430159, 430539, 430303, 430531, 430954, 430961, 430286, 430287, 101467, 101457, G03C 194, G03C 170, G03C 171

Patent

active

048616982

ABSTRACT:
A photosensitive lithographic plate is suitable for use in making a water-less lithographic plate which does not require dampening water. The photosensitive lithographic plate has a primer layer containing a hardened gelatin, a photosensitive layer and a silicone rubber layer. The silicone rubber layer and the photosensitive layer are imagewise removed as a result of the imagewise exposure and development so as to expose portions of the primer layer corresponding to an image. The exposed gelatin-containing plate is securely adhered to the substrate and is easily dyeable for examination of the formed image.

REFERENCES:
patent: 2729562 (1956-01-01), Zemp
patent: 2937085 (1960-05-01), Seven et al.
patent: 3677178 (1972-07-01), Gipe
patent: 4450215 (1984-05-01), Reithel et al.
patent: 4590148 (1986-05-01), Takahashi et al.

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