Photosensitive lithographic plate requiring no dampening water h

Details Photosensitive lithographic plate requiring no dampening water h Photosensitive lithographic plate requiring no dampening water h

1988-06-03

1989-09-05

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430273, 430539, G03C 176

Patent

active

048638315

ABSTRACT:
The present invention relates to a photosensitive lithographic plate requiring no dampening water, which comprises a support, a primer layer comprising a gelatin and a silane coupling agent, a photosensitive layer, and a silicone rubber layer in this order. According to the present invention, a photosensitive lithographic plate having a primer layer with an excellent resistance to a solvent and dyeability is obtained.

REFERENCES:
patent: 4060656 (1977-11-01), Naka et al.
patent: 4162919 (1979-07-01), Richter et al.
patent: 4304851 (1981-12-01), McGrail et al.
patent: 4396709 (1983-08-01), Kameoka et al.
patent: 4427767 (1984-01-01), Beebe et al.
patent: 4481282 (1984-11-01), Obata et al.

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