Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1989-03-13
1989-10-17
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430303, 430287, 430285, 430283, G03C 168, G03C 170, G03C 171
Patent
active
048746860
ABSTRACT:
The present invention relates to a photosensitive lithographic plate necessitating no damping water, which plate has an excellent image reproducibility and stability in the lapse of time. The plate comprises, on a support, a photosensitive layer and a silicone rubber layer in this order, the silicone rubber layer being formed by addition reaction of an SiH group with a --CH.dbd.CH- group to cause crosslinking, and the photosensitive layer comprising:
Higashi Tatsuji
Kita Nobuyuki
Takahashi Hiroshi
Urabe Yoshihiko
Fuji Photo Film Co. , Ltd.
Hamilton Cynthia
Michl Paul R.
LandOfFree
Photosensitive lithographic plate necessitating no dampening wat does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive lithographic plate necessitating no dampening wat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive lithographic plate necessitating no dampening wat will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1743214