Photosensitive lithographic plate and process for producing same

Details Photosensitive lithographic plate and process for producing same Photosensitive lithographic plate and process for producing same

1998-06-03

2000-08-29

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430162, 4302761, 4302711, 430950, 430525, G03F 711

Patent

active

061106429

ABSTRACT:
In a photosensitive lithographic plate including a photosensitive layer coated on the surface of a substrate and a mat layer formed on the photosensitive layer, plural resinous protrusions are provided on the back surface of the substrate in the form of a layer. Deterioration of vacuum adhesion due to the mat collapsed in a production process of a photosensitive lithographic plate including a step of winding is prevented, consequently, a photosensitive lithographic plate with uniform quality is obtained regardless of its wound position.

REFERENCES:
patent: 4557994 (1985-12-01), Nagano et al.
patent: 4781941 (1988-11-01), Inukai et al.
patent: 5028512 (1991-07-01), Nagatani et al.
Database WPI, Section Ch, Week 8644, Derwent Publications Ltd., London, GB; Class A89, AN 86-289524, XP002075438 & JP 61-213843A (Fuji Photo Film Co. Ltd.) *abstract*.
Database WPI, Section Ch, Week 8848, Derwent Publications Ltd., London, GB; Class A89, AN 88-341847 XP002075439 & JP 63-253941A (Fuji Photo Film Co. Ltd.) *abstract*.
Patent Abstracts Of Japan, vol. 011, No. 168 (M-594), May 29, 1987 & JP 62-001586A (Fuotopori Ouka KK), Jan. 7, 1987 *abstract*.

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