Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1986-02-06
1987-08-04
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430285, 528 45, 528 75, 528308, 528296, 528 26, G03C 168, C08G 1881, C08G 1810
Patent
active
046846018
ABSTRACT:
A photosensitive image-forming material having a photosensitive layer, said photosensitive layer comprising a photosensitive resin resulting from the reaction of a hydroxyl-containing polyester precursor composed of dicarboxylic acid units derived from a dicarboxylic acid having a photosensitive unsaturated double bond adjacent to an aromatic ring and glycol units with a chain extender having in the molecule at least two functional groups capable of reacting with the hydroxyl groups of the polyester precursor.
REFERENCES:
patent: T892006 (1971-11-01), Laakso et al.
patent: 2956878 (1960-11-01), Michiels et al.
patent: 3677920 (1972-07-01), Kai et al.
patent: 3726685 (1973-04-01), Phlipot et al.
patent: 3873505 (1975-03-01), Laakso et al.
patent: 4258124 (1981-05-01), Shimizu et al.
Muta Tomonobu
Nakamura Chiaki
Oe Kouji
Sasaki Toshiki
Dainippon Ink and Chemicals Inc.
Hamilton Cynthia
Kittle John E.
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