Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1984-06-11
1985-12-24
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
526273, 5263077, 20415914, 430285, 430287, G03C 168, C08F22400, C08F21802
Patent
active
045606404
ABSTRACT:
A photosensitive high polymer which is a random copolymer comprising a structural unit represented by the formula ##STR1## wherein A is ##STR2## wherein R is hydrogen, methyl or methoxy and a structural unit represented by the formula ##STR3## the polymer containing about 5 to about 80 mole % of structural units of the formula (I) and having a polymerization degree of about 300 to about 3000, a process for preparing the photosensitive high polymer and a composition comprising the photosensitive high polymer and solvent.
REFERENCES:
patent: 3409593 (1968-11-01), Messwarb et al.
Matsushita Electric Industrial Co. Ltd.: "Photosensitive Resins" Chemical Abstracts, vol. 100, abstract No. 210966d of Japanese Kokai Tokkyo Koho, Japan 15,418 of Jan. 26, 1984.
Asano Takateru
Ichihashi Taichi
Kawai Wasaburo
Naraoka Tadashi
Director-General of Agency of Industrial Science & Technology
Hamilton Cynthia
Kittle John E.
Sanbo Chemical Industries Co., Ltd.
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