Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1985-09-19
1987-08-25
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430914, 430926, 430921, 430925, 430922, 522 15, 522 23, 522 25, 522 31, G03C 1495, G03C 171, G03C 172
Patent
active
046892885
ABSTRACT:
Photosensitive film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process for producing electronic components.
REFERENCES:
patent: 4442197 (1984-04-01), Crivello et al.
patent: 4551417 (1985-11-01), Suzuki et al.
Buiguez Francois
Giral Louis
Rosilio Charles
Schue Francois
Commissariat a l''Energie Atomique
Hamilton Cynthia
Kittle John E.
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