Photosensitive elements containing polymer of imidylcompounds

Details Photosensitive elements containing polymer of imidylcompounds Photosensitive elements containing polymer of imidylcompounds

1986-09-08

1987-09-29

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430300, 430311, 430325, 430270, 526262, G03C 176

Patent

active

046968202

ABSTRACT:
There are obtained from N-(hydroxypolyoxaalkylene)imidyl compounds and (meth)acrylic acid esters thereof homopolymers or copolymers with olefinically unsaturated comonomers. These polymers are photosensitive and are suitable as photographic recording material, as adhesives and as agents for surface coating.

REFERENCES:
patent: 4079041 (1978-03-01), Baumann et al.
patent: 4163097 (1979-07-01), Baumann et al.
patent: 4242264 (1980-12-01), Zweifel et al.
patent: 4532332 (1985-07-01), Muller
patent: 4629773 (1986-12-01), Muller

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