Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1993-12-06
1995-04-18
Chapman, Mark A.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430 14, 430 15, 430 18, 430273, 430300, 430306, G03C 1492
Patent
active
054077818
ABSTRACT:
A photosensitive element comprising (a) a support, (b) a thermally hardened layer containing the reaction product of (i) either an organic polymer having reactive segments and nonreactive segments or a blend of organic polymers wherein at least one polymer has reactive segments and at least one polymer has nonreactive segments (ii) a crosslinking agent and (iii) a catalyst and (c) a photohardenable layer is described.
REFERENCES:
patent: 4459348 (1984-07-01), Jun et al.
patent: 5006447 (1991-04-01), Umeda et al.
patent: 5015556 (1991-05-01), Martens
patent: 5041357 (1991-08-01), Gersdorf et al.
patent: 5082824 (1992-01-01), Rhoades et al.
Feinberg Bernard
Pankratz Richard P.
Chapman Mark A.
E. I. Du Pont de Nemours and Company
LandOfFree
Photosensitive element having support with adjustable adhesion does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive element having support with adjustable adhesion, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive element having support with adjustable adhesion will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-65992