Photosensitive element containing a polymer of an indenone based

Details Photosensitive element containing a polymer of an indenone based Photosensitive element containing a polymer of an indenone based

1982-08-19

1983-10-11

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415922, 428195, 428209, 428901, 430272, 430276, 430311, 526280, 526283, G03C 178

Patent

active

044093187

ABSTRACT:
The use of polymers including an indanone entity for use as a resist in a photosensitive body used in a lithographic process leads to desirable results. These resists have excellent resolution essentially equivalent to that obtainable with poly(methyl methacrylate). Additionally, the sensitivities of these polymers to the actinic radiation typically used in photolithographic processes, e.g., radiation from a mercury lamp, is significantly better than that obtained with poly(methyl methacrylate).

REFERENCES:
patent: 3959234 (1976-05-01), Kurosawa et al.
patent: 4297433 (1981-10-01), Tsuda et al.
patent: 4302529 (1981-11-01), Lai
patent: 4304840 (1981-12-01), Helbert

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