Photosensitive element comprising a substrate and an alkaline so

Details Photosensitive element comprising a substrate and an alkaline so Photosensitive element comprising a substrate and an alkaline so

1985-08-12

1987-05-19

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430272, 430311, 430320, 430326, 522 65, 522126, G03C 176

Patent

active

046668209

ABSTRACT:
Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.

REFERENCES:
patent: 3849137 (1974-11-01), Barzynski et al.
patent: 3949143 (1976-04-01), Schlesinger
patent: 4131465 (1978-12-01), Petropoulos
patent: 4150989 (1979-04-01), Chambers et al.
patent: 4440461 (1983-08-01), Chandross et al.
patent: 4551416 (1985-11-01), Chandross et al.

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