Photosensitive elastomeric element having improved solvent resis

Details Photosensitive elastomeric element having improved solvent resis Photosensitive elastomeric element having improved solvent resis

1990-09-05

1992-08-04

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430286, 430306, 430912, 430907, 522121, 522125, G03F 7033, G03F 711, G03F 730

Patent

active

051358379

ABSTRACT:
A photosensitive elastomeric composition and process of using the composition to prepare flexographic printing plates having substantially improved solvent resistance are described.

REFERENCES:
patent: 4430417 (1984-02-01), Heinz et al.
patent: 4460675 (1981-07-01), Gruetzmacher et al.
patent: 4686172 (1987-08-01), Worns et al.

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