Photosensitive elastomeric element having improved solvent resis

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Details

430286, 430306, 430912, 430907, 522121, 522125, G03F 7033, G03F 711, G03F 730

Patent

active

051358379

ABSTRACT:
A photosensitive elastomeric composition and process of using the composition to prepare flexographic printing plates having substantially improved solvent resistance are described.

REFERENCES:
patent: 4430417 (1984-02-01), Heinz et al.
patent: 4460675 (1981-07-01), Gruetzmacher et al.
patent: 4686172 (1987-08-01), Worns et al.

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