Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1988-05-11
1990-12-25
Bleutge, John C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430286, 430287, 430907, 522 43, 522116, 522117, 522121, 522125, 525310, 525910, G03F 7033, C08L 5302
Patent
active
049802690
ABSTRACT:
A photosensitive elastomeric composition comprising (1) at least one elastomer, (2) an addition-polymerizable compound having at least one CH.sub.2 .dbd.C< group and (3) a polymerization initiator activatable by actinic light, wherein the elastomer (1) is an elastomer selected from (a) an elastomeric polymer composed of a polyene monomer containing at least two non-conjugated double bonds and a conjugated diene-type monomer or both a conjugated diene-type monomer and a copolymerizable vinyl monomer and (b) an elastomeric linear A-B type (wherein A represents a polymer block of a monovinyl aromatic compound and B represents a polymer block of a conjugated diene-type monomer) block copolymer in which a terminal group having a polymerizable ethylenic double bond is present in at least one end of the molecular chain.
REFERENCES:
patent: 3937659 (1976-02-01), Boldt et al.
patent: 4027063 (1977-05-01), Fujiwara et al.
patent: 4033840 (1977-07-01), Fujiwara et al.
patent: 4045231 (1977-08-01), Toda et al.
patent: 4162919 (1979-07-01), Richter
patent: 4174218 (1979-11-01), Pohl
patent: 4320188 (1982-03-01), Heinz et al.
patent: 4574142 (1986-03-01), Charnock
Kidokoro Hiroto
Sakurai Fusayoshi
Tamura Mitsuhiro
Bleutge John C.
Buttner David
Nippon Zeon Co. Ltd.
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