Photosensitive elastomeric composition

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430286, 430287, 430907, 522114, 522117, 522121, G03F 7033, C08F27902

Patent

active

052815102

ABSTRACT:
A photosensitive elastomeric composition comprising (1) at least one elastomer, (2) an addition-polymerizable compound having at least one CH.sub.2 .dbd.C< group and (3) a polymerization initiator activatable by actinic light, wherein the elastomer (1) is an elastomer selected from (a) an elastomeric polymer composed of a polyene monomer containing at least two non-conjugated double bonds and a conjugated diene-type monomer or both a conjugated diene-type monomer and a copolymerizable vinyl monomer and (b) an elastomeric linear A-B type (wherein A represents a polymer block of a monovinyl aromatic compound and B represents a polymer block of a conjugated diene-type monomer) block copolymer in which a terminal group having a polymerizable ethylenic double bond is present in at least one end of the molecular chain.

REFERENCES:
patent: 3937659 (1976-02-01), Boldt
patent: 4027063 (1977-05-01), Fujiwara
patent: 4033840 (1977-07-01), Fujiwara
patent: 4045231 (1977-08-01), Toda
patent: 4174218 (1979-11-01), Pohl
patent: 4320188 (1982-03-01), Heinz

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