Photosensitive elastomeric composition

Details Photosensitive elastomeric composition Photosensitive elastomeric composition

1992-12-30

1994-01-25

Buttner, David

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430286, 430287, 430907, 522114, 522117, 522121, G03F 7033, C08F27902

Patent

active

052815102

ABSTRACT:
A photosensitive elastomeric composition comprising (1) at least one elastomer, (2) an addition-polymerizable compound having at least one CH.sub.2 .dbd.C< group and (3) a polymerization initiator activatable by actinic light, wherein the elastomer (1) is an elastomer selected from (a) an elastomeric polymer composed of a polyene monomer containing at least two non-conjugated double bonds and a conjugated diene-type monomer or both a conjugated diene-type monomer and a copolymerizable vinyl monomer and (b) an elastomeric linear A-B type (wherein A represents a polymer block of a monovinyl aromatic compound and B represents a polymer block of a conjugated diene-type monomer) block copolymer in which a terminal group having a polymerizable ethylenic double bond is present in at least one end of the molecular chain.

REFERENCES:
patent: 3937659 (1976-02-01), Boldt
patent: 4027063 (1977-05-01), Fujiwara
patent: 4033840 (1977-07-01), Fujiwara
patent: 4045231 (1977-08-01), Toda
patent: 4174218 (1979-11-01), Pohl
patent: 4320188 (1982-03-01), Heinz

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