Photosensitive copolymer on silicon support

Details Photosensitive copolymer on silicon support Photosensitive copolymer on silicon support

1976-02-20

1977-10-18

Brammer, Jack P.

Gas separation: apparatus

Electric field separation apparatus

Including gas flow distribution means

96 351, 96 362, 96 86P, 96115R, 20415914, 260 63R, 260 63UY, G03C 168, G03C 500

Patent

active

040544540

ABSTRACT:
Copolymers of certain keto-olefins and SO.sub.2 are sensitive to light and form films useful as photoresists in the manufacture of printed circuits, integrated circuits, printing plates and the like.

REFERENCES:
patent: 3884696 (1975-05-01), Bowden et al.
patent: 3935331 (1976-01-01), Poliniak et al.

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