Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2008-12-17
2011-10-25
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000, C430S330000, C430S914000, C560S055000, C560S056000, C560S057000, C560S059000, C560S061000, C560S064000, C560S073000, C560S116000, C560S118000, C560S119000, C560S127000, C560S129000, C560S130000, C560S138000, C560S139000, C560S140000, C560S141000, C560S144000, C560S146000, C560S174000, C560S176000, C560S190000, C560S193000, C560S194000, C560S198000, C560S201000, C568S593000, C568S633000, C568S640000, C568S644000, C549S415000
Reexamination Certificate
active
08043789
ABSTRACT:
A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent.In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R′ and R″ are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R′″ is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.
REFERENCES:
patent: 6200729 (2001-03-01), Aoai et al.
patent: 2007-119370 (2007-05-01), None
Derwent English abstract for JP2007-119370.
Machine-assisted English translation of JP2007-119370.
Kim Jae-Hyun
Lee Jae-Woo
Lee Jun-Gyeong
Lim Young-Bae
Yoo Min-Ja
Birch & Stewart Kolasch & Birch, LLP
Dongjin Semichem Co., Ltd.
Lee Sin J.
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