Photosensitive compositions useful in three-dimensional part-bui

Details Photosensitive compositions useful in three-dimensional part-bui Photosensitive compositions useful in three-dimensional part-bui

1993-11-10

1995-05-23

Chapman, Mark A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

430284, 522 8, 522 10, 522 90, 522100, 522103, G03C 500, G03C 1725, C08F 246

Patent

active

054181127

ABSTRACT:
A method useful for stereolithography that yields enhanced photospeed, as well as a photocurable polymer composition well adapted for use with same, are disclosed.
A preferred combination includes 1,2-dimethoxy-2-phenyl acetophenone, benzophenone, and triphenyl phosphine combined with a polyurethane (meth)acrylate oligomer.

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