Photosensitive compositions useful for forming active...

Details Photosensitive compositions useful for forming active... Photosensitive compositions useful for forming active...

2007-01-19

2011-11-08

Chu, John (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S270100, C430S921000

Reexamination Certificate

active

08053158

ABSTRACT:
Disclosed herein are compositions useful in forming organic active patterns that may, in turn, be incorporated in organic memory devices. The compositions comprise N-containing conjugated electroconductive polymer(s), photoacid generator(s) and organic solvent(s) capable of dissolving suitable quantifies of both the electroconductive polymer and the photoacid generator. Also disclosed are methods for patterning organic active layers formed using one or more of the compositions to produce organic active patterns, portions of which may be arranged between opposed electrodes to provide organic memory cells. The methods include directly exposing and developing the organic active layer to obtain fine patterns without the use of a separate masking pattern, for example, a photoresist pattern, thereby tending to simplify the fabrication process and reduce the associated costs.

REFERENCES:
patent: 5436092 (1995-07-01), Ohtsuka et al.
patent: 5558971 (1996-09-01), Urano et al.
patent: 6638680 (2003-10-01), Lamotte et al.
patent: 6689530 (2004-02-01), Ohsawa et al.
patent: 6919158 (2005-07-01), Kawamura et al.
patent: 6949329 (2005-09-01), Endo et al.
patent: 7488569 (2009-02-01), Kozawa et al.
patent: 2001/0018162 (2001-08-01), Hatakeyama et al.
patent: 2003/0044717 (2003-03-01), Kodama
patent: 2005/0277055 (2005-12-01), Kon

Affiliated with

Also associated with

Rating

Photosensitive compositions useful for forming active... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive compositions useful for forming active..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive compositions useful for forming active... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4269431