Photosensitive compositions having enhanced photopolymerization

Details Photosensitive compositions having enhanced photopolymerization Photosensitive compositions having enhanced photopolymerization

1990-08-14

1991-04-30

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430286, 430287, 430288, 430916, 430918, 430923, 522 21, 522 30, G03C 1725

Patent

active

050117629

ABSTRACT:
A photosensitive composition which is suitable for free radical polymerization systems initiated by ultraviolet light, particularly useful in UV-curing coating and image transfer systems such as printing plates and photoresists. Among the above mentioned applications, systems in which the photosensitive layer has no protective film to insulate it from the air shows the greatest improvement in photosensitivity.

REFERENCES:
patent: 3640718 (1972-02-01), Smith
patent: 3891441 (1975-06-01), Tsuji et al.
patent: 4248958 (1981-02-01), Faust
patent: 4478977 (1984-10-01), Sperry
patent: 4645465 (1986-08-01), Morgan et al.
patent: 4857654 (1989-08-01), Riedker et al.
patent: 4859572 (1989-08-01), Farid et al.

Affiliated with

Also associated with

Rating

Photosensitive compositions having enhanced photopolymerization does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive compositions having enhanced photopolymerization , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive compositions having enhanced photopolymerization will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-640012