Photosensitive compositions containing stilbazolium groups

Details Photosensitive compositions containing stilbazolium groups Photosensitive compositions containing stilbazolium groups

1992-05-29

1994-07-19

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430909, 525 59, 525 61, G03C 173, C08F 800

Patent

active

053308778

ABSTRACT:
Polyvinyl alcohol is modified by reaction with a stilbazol quaternary salt acetal to produce a water soluble polymer capable of photodimercezing on exposure to active radiation to yield water-soluble photoresist materials.

REFERENCES:
patent: 4287335 (1981-09-01), Ichimura
patent: 4339524 (1982-07-01), Ichimura et al.
patent: 5021505 (1991-06-01), Ichimura et al.
Ichimura et al., J. Polym. Sci. Polym. Chem. Ed., 18, 891-902 (1980) "Immobilization of Enzymes with use of Photosensitive Polymers having the Stilbazolium Group".

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