Photosensitive compositions containing a photooxidizable compone

Details Photosensitive compositions containing a photooxidizable compone Photosensitive compositions containing a photooxidizable compone

1980-06-11

1981-06-02

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415915, 20415916, 430281, 430283, 430288, G03C 168

Patent

active

042712599

ABSTRACT:
The invention concerns photosensitive compositions. The composition contains certain essential components which form peroxides when exposed to light. Essential to the composition are an ethylenically unsaturated component capable of forming a high polymer by addition polymerization or crosslinking, an oxidizable component containing allylic hydrogens, and a photooxygenation sensitizer.

REFERENCES:
patent: 3764324 (1973-10-01), Reyes
patent: 3840390 (1974-10-01), Kozu et al.
patent: 3846266 (1974-11-01), Duynstee et al.
Duynstee et al., Sensitized Photooxidation of EPOM Rubber, Central Laboratory, DSM, Geleen, Netherlands, 6/14/72.

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