Photosensitive compositions

Details Photosensitive compositions Photosensitive compositions

1993-04-05

1995-08-29

Chapman, Mark A.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430287, 430906, 430909, 522149, 525 59, 525 61, G03C 1492

Patent

active

054459168

ABSTRACT:
Photopolymers based on polyvinyl alcohol derivatives of 8-hydroxy quinoline compositions having a high degree of photosensitivity, a marked degree of water solubility, and the ability to photodimerize when exposed to actinic radiation.

REFERENCES:
patent: 2811443 (1957-10-01), Robertson et al.
patent: 4891300 (1990-01-01), Ichimura et al.
patent: 5134047 (1992-07-01), Inada et al.
patent: 5206113 (1993-04-01), Mueller-Hess et al.
patent: 5326669 (1994-07-01), Curtis
Preparation and Charateristics of Photcrosslinkable Poly (vinyl-Alcohol), Ichimura, K., et al., vol. 20, 1419-1430-1432 (1982).
Defensive Publication T871,009., Borden, D. G. et al.

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