Photosensitive compositions

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430287, 430909, 430281, 525 59, 525 61, G03C 173, C08F 800

Patent

active

053266692

ABSTRACT:
A photosensitive polymer composition comprising a compound of the structure ##STR1## wherein ##STR2## is a polyvinyl acetal, n is an integer from 1 to 6,

REFERENCES:
patent: T871009 (1970-02-01), Borden et al.
patent: 2811510 (1957-10-01), Leubner et al.
patent: 2908667 (1959-10-01), Williams
patent: 3737319 (1973-06-01), Borden
patent: 5061603 (1991-10-01), Hamilton et al.
patent: 5206113 (1993-04-01), Mueller-Hess et al.
Ichimura et al. J. Polym. Sci. Polym. Chem. Ed., 20, 1419-1432 (1982).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photosensitive compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photosensitive compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive compositions will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-795480

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.