Photosensitive compositions

Details Photosensitive compositions Photosensitive compositions

1979-04-11

1981-01-06

Louie, Jr., Won H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430282, 430906, G03C 168

Patent

active

042437431

ABSTRACT:
This invention relates to a photosensitive composition comprising a precursor of a heat resistant polymer having carboxylic groups and a compound having a photosensitive olefinic double bond and an amino or quaternary ammonium salt. The photosensitive composition can give highly heat resistant relief patterns with good edge sharpness, good mechanical and chemical properties as well as good insulating properties. The heat resistant relief patterns obtained from the composition of this invention are especially useful as insulating, passivation or protective coatings in semiconductor devices.

REFERENCES:
patent: 3953877 (1976-04-01), Sigusch et al.
patent: 3957512 (1976-05-01), Kleeberg
patent: 4040831 (1977-08-01), Rubner et al.
patent: 4139391 (1979-02-01), Ikeda et al.

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