Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
1998-10-14
2001-03-13
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S911000, C522S087000
Reexamination Certificate
active
06200733
ABSTRACT:
FIELD OF THE INVENTION
This invention relates to a novel photosensitive composition for sandblasting. More particularly it relates to a photosensitive composition for sandblasting which is excellent in elasticity, softness, alkali developability, adhesion to a substrate, sensitivity, and resistance to sandblasting and to a photosensitive film having a photosensitive layer for sandblasting.
BACKGROUND OF THE INVENTION
Sandblasting is known as one of the techniques for patterning the surface of a substrate such as glass, stone, plastics, ceramics, leather, and wood. Pattern formation by sandblasting is carried out by a process using a stencil in which a rubber sheet, paper, etc. is stuck to the substrate and cut with a cutter, etc. to form a stencil pattern, and an abrasive is made to strike against the substrate to selectively abrade the substrate or a process using a photomask in which a photosensitive layer is provided on the substrate, a mask pattern is formed by photolithography, and an abrasive is made to strike against to selectively abrade the substrate. The former process involves troublesome operations with low working efficiency. On the other hand, the latter photolithographic process achieves high working efficiency and enables fine processing and is effective for production of circuit boards composed of a metallic pattern and an insulating pattern, particularly for the formation of a metallic wiring pattern or an insulating pattern made of ceramics, fluorescence substances, etc. of a plasma display panel.
Photosensitive compositions for the photosensitive layer which have been proposed to date for use in sandblasting include a screen-printable composition comprising a urethane prepolymer having an ethylenically unsaturated group at the terminal, a monofunctional ethylenically unsaturated compound, and a polymerization initiator (see JP-A-60-10242, the term “JP-A” as used herein means an “unexamined published Japanese patent application”), a composition comprising an unsaturated polyester, an unsaturated monomer, and a photopolymerization initiator (see JP-A-55-103554), and a composition comprising polyvinyl alcohol and a diazo resin (see JP-A-2-69754). However, since these photosensitive resin compositions are liquid, they are difficult to handle, and film thickness control is difficult.
A photosensitive composition for sandblasting, which is free from the above disadvantage, mainly comprising a urethane prepolymer having an ethylenically unsaturated group at the terminal and having incorporated therein a cellulose derivative and a polymerization initiator, is proposed in JP-A-6-161098. While the proposed composition has high elasticity, high softness and excellent alkali developability and is superior to the conventional ones in sensitivity and adhesion to a substrate, it is still unsatisfactory in sensitivity, adhesion to a substrate and resistance to sandblasting. It has therefore been demanded to develop a photosensitive composition for sandblasting with improved characteristics.
SUMMARY OF THE INVENTION
An object of the present invention is to provide a photosensitive composition for sandblasting which is excellent in sensitivity, adhesion to a substrate and resistance to sandblasting as well as elasticity, softness, and alkali developability.
Another object of the present invention is to provide a photosensitive film having a photosensitive layer comprising the above-described photosensitive composition.
The inventors have continued their study and reached the thought that modification of the photosensitive resin composition disclosed in JP-A-6-161098 supra might be a shortcut to accomplishment of the above objects, considering that the composition is easy to handle and superior to conventional photosensitive resin compositions for sandblasting in sensitivity, adhesion to a substrate and resistance to sandblasting. As a result of further study led by this thought, they have found that the sensitivity, adhesion to a substrate and resistance to sandblasting are greatly improved by using a specific cellulose compound as the cellulose derivative. The present invention has been completed based on this finding.
The present invention relates to a photosensitive composition for sandblasting comprising (A) a photopolymerizable urethane (meth)acrylate oligomer having at least two acryloyl groups and/or methacryloyl groups, (B) a photopolymerization initiator, and (C) at least one cellulose derivative selected from the group consisting of hydroxypropyl cellulose, ethylhydroxyethyl cellulose, hydroxypropylmethyl cellulose phthalate, and hydroxypropylmethyl cellulose acetate phthalate.
The present invention also relates to a photosensitive film for sandblasting having a photosensitive layer comprising the above-described photosensitive composition.
The photosensitive composition for sandblasting according to the present invention exhibits excellent sensitivity, adhesion to a substrate and resistance to sandblasting as well as high elasticity and softness and sufficient alkali developability. The photosensitive film according to the present invention is easy to position and suitable for fine processing.
REFERENCES:
patent: 3907574 (1975-09-01), Yonezawa et al.
patent: 4228232 (1980-10-01), Rousseau
patent: 4855212 (1989-08-01), Tate et al.
patent: 4956265 (1990-09-01), Klun et al.
Mizusawa Ryuma
Nakazato Syunji
Obiya Hiroyuki
Hamilton Cynthia
Sughrue Mion Zinn Macpeak & Seas, PLLC
Tokyo Ohka Kogyo Co. Ltd.
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