Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-08-23
2005-08-23
Lee, Sin J. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S320000, C430S321000, C430S325000, C430S905000, C430S914000, C430S916000, C522S099000, C522S172000
Reexamination Certificate
active
06933097
ABSTRACT:
A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer represented by the following formula (1), wherein X denotes hydrogen, deuterium, halogen, an alkyl group or an alkoxy group; m is an integer from 1 to 5; x and y represent the proportion of respective units, and neither x nor y is 0; and R1denotes a methyl, ethyl, or isopropyl group; a production method thereof, and a polymer optical waveguide pattern formation method using the same.
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Machine-Assisted English translation of JP 11-023886 provided by Japan Patent Office.
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Machine-Assisted English translation for the Japanese document, JP 9-124793 (Hayashida et al.).
Enbutsu Koji
Hayashida Shoichi
Imamura Saburo
Kurihara Takashi
Maruno Tohru
Alston & Bird LLP
Lee Sin J.
Nippon Telegraph and Telephone Corporation
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