Photosensitive composition containing an ethylenically unsaturat

Details Photosensitive composition containing an ethylenically unsaturat Photosensitive composition containing an ethylenically unsaturat

1979-12-21

1981-08-04

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430286, 430287, 430288, 430920, 20415923, 20415915, G03C 168

Patent

active

042823099

ABSTRACT:
A photosensitive composition of matter suited for the production of polymer resist images which composition comprises a mixture of:

REFERENCES:
patent: 3558309 (1971-01-01), Laridon et al.
patent: 3870524 (1975-03-01), Watanabe et al.
patent: 4062686 (1977-12-01), Van Allan et al.
patent: 4171977 (1979-10-01), Hasegawa et al.
Encyclopedia of Polymer Science and Technology, Supplemental vol. 1, 1976, John Wiley & Son, Inc. p. 435.

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