Photosensitive composition, compound used for photosensitive...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S326000, C430S910000, C430S919000, C430S921000, C430S925000, C430S945000

Reexamination Certificate

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08003294

ABSTRACT:
A photosensitive composition comprises: (A) a compound capable of generating an acid represented by formula (I) upon irradiation with actinic ray or radiation; and (B) a resin that decomposes by the action of an acid to its increase solubility in an alkali developerwherein Ra represents an alkyl group substituted with a fluorine atom, or an aryl group substituted with a fluorine atom or a group having a fluorine atom; Rb represents an alkyl group not substituted with a fluorine atom on α-position of the alkyl group, or an aryl group not substituted with a fluorine atom or a group having a fluorine atom.

REFERENCES:
patent: 6777160 (2004-08-01), Sato et al.
patent: 7718344 (2010-05-01), Kamimura et al.
patent: 2003/0207201 (2003-11-01), Hatakeyama et al.
patent: 2006/0264528 (2006-11-01), Wada
patent: 2008/0081282 (2008-04-01), Kamimura et al.
patent: 2002-268223 (2002-09-01), None
patent: 2003-231673 (2003-08-01), None
patent: 2003-261529 (2003-09-01), None
patent: 2004-12554 (2004-01-01), None
patent: 2004-62154 (2004-02-01), None
patent: 2005/040922 (2005-05-01), None

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