Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-01-23
2007-01-23
Gilliam, Barbara L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S302000
Reexamination Certificate
active
10704609
ABSTRACT:
The present invention provides a photosensitive composition comprising an infrared absorbing agent represented by the following formula (I) and a polymer compound which is insoluble in water and soluble in an aqueous alkali solution and becoming soluble in an aqueous alkali solution by radiation of an infrared laser. In the formula described below, R1and R2independently represent an alkyl group having 1 to 18 carbon atoms or an alkyl group having 9 to 30 carbon atoms and Z represents a heptamethine group which may have a substituent. The definitions of other substituents are shown in the specification. According to the present invention, a photosensitive composition having high development latitude and storage stability, together with a positive type planographic printing plate for direct plate-making which can form an image with high sensitivity by using an infrared laser, are provided.
REFERENCES:
patent: 4756993 (1988-07-01), Kitatani et al.
patent: 5576443 (1996-11-01), Fabricius et al.
patent: 5989772 (1999-11-01), Tutt et al.
patent: 6072059 (2000-06-01), Harada et al.
patent: 6083663 (2000-07-01), Vermeersch et al.
patent: 6106996 (2000-08-01), Van Damme et al.
patent: 6153353 (2000-11-01), Van Damme et al.
patent: 6159657 (2000-12-01), Fleming et al.
patent: 6342336 (2002-01-01), Verschueren et al.
patent: 6391517 (2002-05-01), Verschueren et al.
patent: 6447977 (2002-09-01), Vermeersch et al.
patent: 6472119 (2002-10-01), Verschueren et al.
patent: 2002/0015911 (2002-02-01), Nakamura
patent: 0841189 (1998-05-01), None
patent: 0854382 (1998-07-01), None
patent: 0901902 (1999-03-01), None
patent: 0909657 (1999-04-01), None
patent: 08-245902 (1996-09-01), None
patent: 10-114151 (1998-05-01), None
patent: 10-123659 (1998-05-01), None
patent: 10-123660 (1998-05-01), None
patent: 2001-142202 (2001-05-01), None
patent: 2001-209172 (2001-08-01), None
patent: 01/14931 (2001-03-01), None
Kurita Hiromichi
Nakamura Ippei
Buchanan & Ingersoll & Rooney PC
Fuji Photo Film Co. , Ltd.
Gilliam Barbara L.
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