Photosensitive composition and photosensitive planographic print

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430165, 430176, 430192, 4302701, 4302751, 4302781, 4302871, 4302881, 430302, 430905, 430910, G03F 7021, G03F 7023, G03F 7033, G03C 177

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057311277

ABSTRACT:
A photosensitive composition which comprises a resin (A) having urea bonds in its side chains and a photosensitive compound (B), wherein the resin (A) contains at least one resin selected from the group consisting of a vinyl polymer resin and a condensation polymer resin, provides a coating layer with excellent resistance to solvents and abrasion. The photosensitive composition is suitable for use in the production of planographic printing plates, integrated circuits (IC) or photomasks. A photosensitive planographic printing plate produced usig the photosensitive composition has superior press-life.

REFERENCES:
patent: 4248958 (1981-02-01), Faust
patent: 4275138 (1981-06-01), Kita et al.
patent: 4293635 (1981-10-01), Flint et al.
patent: 4294905 (1981-10-01), Okishi et al.
patent: 4950582 (1990-08-01), Aoai et al.
patent: 5340685 (1994-08-01), Sekiya
Patent Abstracts of Japan, vol. 008, No.033, Feb. 14, 1984, JP 58 189627.

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