Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1996-04-09
1998-03-24
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430165, 430176, 430192, 4302701, 4302751, 4302781, 4302871, 4302881, 430302, 430905, 430910, G03F 7021, G03F 7023, G03F 7033, G03C 177
Patent
active
057311277
ABSTRACT:
A photosensitive composition which comprises a resin (A) having urea bonds in its side chains and a photosensitive compound (B), wherein the resin (A) contains at least one resin selected from the group consisting of a vinyl polymer resin and a condensation polymer resin, provides a coating layer with excellent resistance to solvents and abrasion. The photosensitive composition is suitable for use in the production of planographic printing plates, integrated circuits (IC) or photomasks. A photosensitive planographic printing plate produced usig the photosensitive composition has superior press-life.
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Patent Abstracts of Japan, vol. 008, No.033, Feb. 14, 1984, JP 58 189627.
Aburano Maru
Hayakawa Eiji
Ishizuka Yasuhiro
Oe Koji
Chu John S.
Dainippon Ink and Chemicals Inc.
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