Photosensitive composition and pattern forming method using...

Details Photosensitive composition and pattern forming method using... Photosensitive composition and pattern forming method using...

2007-08-30

2010-11-02

Lee, Sin J. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S905000, C430S914000

Reexamination Certificate

active

07824836

ABSTRACT:
A photosensitive composition contains: a compound capable of generating an acid upon irradiation with actinic rays or radiation; a basic compound represented by the formula (I-a) as defined herein; a basic compound represented by the formula (I-b) as defined herein; and a surfactant represented by the formula (II) as defined herein.

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Machine-assisted English translation of JP 2005-309376 provided by JPO.
Machine-assisted English translation of JP2006-243264 A (Inabe et al) provided by JPO.
Extended European Search Report dated Sep. 18, 2008.

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