Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-03-13
2007-03-13
Chu, John S. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S326000, C430S905000, C430S907000, C430S910000
Reexamination Certificate
active
10937270
ABSTRACT:
A photosensitive composition containing a compound capable of generating a specific acid having the plural number of sulfonic groups by irradiation with an actinic ray or a radiation and a pattern forming method using the same.
REFERENCES:
patent: 5965319 (1999-10-01), Kobayashi
patent: 6492091 (2002-12-01), Kodama et al.
patent: 6514656 (2003-02-01), Nakamura et al.
patent: 2002/0001770 (2002-01-01), Cameron
patent: 1 199 603 (2002-04-01), None
patent: 9-73173 (1997-03-01), None
patent: 9-90637 (1997-04-01), None
patent: 9-309874 (1997-12-01), None
patent: 11-109632 (1998-04-01), None
patent: 2776273 (1998-05-01), None
patent: 10-161313 (1998-06-01), None
patent: 10-207069 (1998-08-01), None
patent: 10-254139 (1998-09-01), None
patent: 10-274852 (1998-10-01), None
patent: 3042618 (2000-03-01), None
patent: 2000-137327 (2000-05-01), None
patent: 2000-241964 (2000-09-01), None
patent: 2001-109154 (2001-04-01), None
patent: 2001-188351 (2001-07-01), None
patent: 2001-215704 (2001-08-01), None
patent: 2002-296783 (2002-10-01), None
patent: WO 02/082185 (2002-10-01), None
patent: WO 2004/107051 (2004-12-01), None
XP-002314167—abstract—Derwent Publications Ltd. (1998) Matsushita Denki Sangyo.
European Search Report dated Feb. 7, 2005.
Kodama Kunihiko
Satoh Kenichiro
Wada Kenji
Chu John S.
Fuji Photo Film Co. , Ltd.
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