Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1999-02-25
2000-08-15
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302701, 430330, 522 71, G03F 7033, G08K 246
Patent
active
061034525
ABSTRACT:
Disclosed are a photosensitive composition which is developable with an aqueous alkaline solution and such calcined patterns as a conductor pattern, a vitreous dielectric pattern, and a fluorescent pattern which are obtained by the use of the photosensitive composition. The photosensitive composition comprises (A) a carboxyl group-containing photosensitive polymer obtained by the reaction of a copolymer of (a) an unsaturated double bond-containing acid anhydride and (b) an unsaturated double bond-containing compound with (c) a compound containing a hydroxyl group and an unsaturated double bond, (B) a diluent, (C) a photopolymerization initiator, (D) an inorganic powder, and (E) a stabilizer. The composition may be in the form of paste or in the form of a dry film. When the photosensitive composition is in the form of paste, the paste is applied to a substrate and then dried to form a film. When the photosensitive composition is in the form of a dry film, the film is laminated on the substrate. A calcined pattern of high fineness is obtained by patterning the superposed layer of the composition by selective exposure to light and development, and thereafter calcining the patterned film.
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Kakinuma Masahisa
Takagi Kouichi
Tomobe Ooki
Ashton Rosemary
Baxter Janet
Kananen Ronald P.
Taiyo Ink Manufacturing Co., Ltd.
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