Photosensitive composition

Details Photosensitive composition Photosensitive composition

2011-01-18

2011-01-18

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000, C430S326000, C430S330000

Reexamination Certificate

active

07871755

ABSTRACT:
A photosensitive composition is provided, which includes a compound represented by the formula BP; and a photo-acid generator which generates an acid by the action of actinic radiation,wherein R1is an acid-leaving group, and a part of R1may be substituted with a hydrogen atom.

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Morikawa, et al., “Preparation of Poly[(ether)-(ether ether ketone)]Dendrimers by the Convergent Method”, Polymer Journal, vol. 32, No. 3, pp. 255-262, 2000.
Kadota, et al., “Novel Electron-Beam Molecular Resists with High Resolution and High Sensitivity for Nanometer Lithography”, The Chemical Society of Japan, Chemistry letters, vol. 33, No. 6, 2004, pp. 706-707.

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