Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-07-20
1992-12-15
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430170, 430192, 534560, 534564, G03C 152, C07C24512
Patent
active
051716569
ABSTRACT:
Photosensitive compositions comprising a polymer and a photoactive constituent, which are able to be developed with aqueous, alkaline agents exhibit good bleaching properties in the DUV range, whereby the photoactive constituent has good solubility-inhibiting properties and does not evaporate during the drying process, when the photoactive constituent comprises diazo tetronic acid or a diazo tetronic acid derivative of the following structure: ##STR1## where the residues R are the same or different and signify H, alkyl, cycloalkyl, aryl or a silicon-containing residue.
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Beck Juergen
Bestmann Hans J.
Leuschner Rainer
Sebald Michael
Sezi Recai
Bowers Jr. Charles L.
Huff Mark F.
Siemens Aktiengesellschaft
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