Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-11-13
2000-08-29
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430906, 430910, 526251, 524544, G03C 152, G03F 7039, G03F 7021, G03F 7023
Patent
active
061106402
ABSTRACT:
A positive working photosensitive composition comprising a specific fluorine-containing copolymer. The positive working photosensitive composition has not only an ability to form a high contrast image but also an ability to inhibit halation, a satisfactory safe light tolerance and a wide development latitude, without lowering the sensitivity.
REFERENCES:
patent: 2566162 (1951-08-01), Caldwell et al.
patent: 2642416 (1953-06-01), Ahlbrecht et al.
patent: 4791166 (1988-12-01), Saukaitis
patent: 4822713 (1989-04-01), Nishioka et al.
patent: 5085975 (1992-02-01), Mueller et al.
patent: 5670299 (1997-09-01), Urano et al.
Kawamura Koichi
Watanabe Noriaki
Fuji Photo Film Co. , Ltd.
Gilmore Barbara
Hamilton Cynthia
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