Photosensitive bis(halomethyloxadiazole) compound and photosensi

Details Photosensitive bis(halomethyloxadiazole) compound and photosensi Photosensitive bis(halomethyloxadiazole) compound and photosensi

1996-08-26

1997-07-29

Gerstl, Robert

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302831, F23Q 102

Patent

active

056520824

ABSTRACT:
Photosensitive bis(halomethyloxadiazole) compounds which are capable of producing free radicals upon exposure to light represented by the following general formulae (1) to (4): ##STR1## The symbols in the above formulae are defined in the present specification. The photosensitive bis(halomethyloxadiazole) compound is useful in the fields of recording materials such as photosensitive protecting films, printing plates, photoresists, proofs, etc. Furthermore, a photosensitive transfer sheet using a photosensitive composition containing the photosensitive bis(halomethyloxadiazole) is useful in making a prepress proof for color proofing, a color display, etc.

REFERENCES:
patent: 3954475 (1976-05-01), Bonham et al.
patent: 3987037 (1976-10-01), Bonham et al.
patent: 4189323 (1980-02-01), Buhr et al.
patent: 5374642 (1994-12-01), Kardoff et al.

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