Photosensitive bilayer composition

Details Photosensitive bilayer composition Photosensitive bilayer composition

2005-08-16

2005-08-16

Lee, Sin J. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S271100, C430S325000, C430S326000, C430S313000, C430S905000, C430S907000, C430S909000, C430S910000, C430S914000, C430S921000, C430S925000, C526S266000, C526S279000

Reexamination Certificate

active

06929897

ABSTRACT:
Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure Iwhere R1is a moiety containing an ethylenically unsaturated polymerizable group, R2is a C1-C3alkylene group, and R3is a C1-10linear or cyclic alkyl group, a C6-10aromatic or substituted aromatic group, a C1-8alkoxy methyl, or a C1-8alkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.

REFERENCES:
Chemical Abstract 1989:440010, Kashutina et al (“Synthesis and Properties of Copolymers of Beta-Substituted Oxadisilacyclohexanes with Octamethylcyclotetrasiloxane”), Vysokomolekulyarnye Soedineniya, Seriya A (1989), vol. 31, no. 4. p. 864-9 (Russian).

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