Photosensitive aqueous emulsion resin composition of polystyrene

Details Photosensitive aqueous emulsion resin composition of polystyrene Photosensitive aqueous emulsion resin composition of polystyrene

1988-08-25

1989-10-31

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430138, 430196, 430197, 430281, G03C 176

Patent

active

048777145

ABSTRACT:
A photosensitive resin composition which comprises as an essential component a resin emulsion comprising resin particles, which do not make coalescence to form a continuous film when the resin emulsion is applied on a substrate and dried, obtained by subjecting a polymerizable composition comprising at least one polymerizable vinyl monomer and at least one of a photo-reactive compound and a photo-initiator dissolved therein to emulsion polymerization.

REFERENCES:
patent: 4099973 (1978-07-01), Miura et al.
patent: 4125700 (1978-01-01), Graham
patent: 4273551 (1981-06-01), Muzyczok et al.
patent: 4277611 (1981-06-01), Vyvial et al.
patent: 4284707 (1981-08-01), Nagasawa et al.

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