Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-01-18
2005-01-18
Ashton, Rosemary (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S910000, C526S281000, C526S242000, C526S319000
Reexamination Certificate
active
06844134
ABSTRACT:
A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50,000 having a repeating unit as follows:wherein R1is a hydrogen atom or methyl group, and R2is a fluorinated ethylene glycol group having 3 to 10 carbon atoms.
REFERENCES:
patent: 20030091794 (2003-05-01), Jing et al.
patent: 2002287285 (2002-10-01), None
Chemical Abstract DN 137:286340 for JP2002287285.*
Chemical Abstract DN 113:192011 for Sharakhmedov et al.*
Copy of Article entitled Polymer design for 157nm chemically amplified resists published in Proc. SPIE, vol. 4345, 273-284 (2001).
Choi Sang-Jun
Moon Joo-Tae
Song Ki-Yong
Woo Sang-Gyun
Yoon Kwang-Sub
Ashton Rosemary
Marger & Johnson & McCollom, P.C.
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